4-DOF Mechanism Design for Reflectors in Vacuum
Authors
Jin-Xin Chen, Wan-Lu Xie, Xiao-Bin Wu, Yu Wang
Corresponding Author
Jin-Xin Chen
Available Online December 2016.
- DOI
- 10.2991/mme-16.2017.52How to use a DOI?
- Keywords
- Vacuum, Reflectors, Mechanism design, Kinematic analysis, 4-DOF.
- Abstract
The paper developed a new type of 4-DOF mechanism design for reflectors in vacuum, which had the ability of assembling the reflector stably and realizing 4-DOF movement (one-translation and three-rotation) of the reflector in vacuum by adjustments outside the vacuum. Then the equations of kinematic analysis were finalized based on the mechanism design. Finally the 4-DOF mechanism design was testified by a practical example. The mechanism design can be used in the field of extreme ultraviolet lithography, as well as other precision machining and positioning applications.
- Copyright
- © 2017, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Jin-Xin Chen AU - Wan-Lu Xie AU - Xiao-Bin Wu AU - Yu Wang PY - 2016/12 DA - 2016/12 TI - 4-DOF Mechanism Design for Reflectors in Vacuum BT - Proceedings of the 3rd Annual International Conference on Mechanics and Mechanical Engineering (MME 2016) PB - Atlantis Press SP - 382 EP - 388 SN - 2352-5401 UR - https://doi.org/10.2991/mme-16.2017.52 DO - 10.2991/mme-16.2017.52 ID - Chen2016/12 ER -