Proceedings of the 2015 International Conference on Materials, Environmental and Biological Engineering

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The High Vacuum Cleaving Passivation Characteristic on 980nm Diode Laser

Authors
Tiansheng Zhao, Zaijin Li, Te Li, Peng Lu, Yi Qu, Baoxue Bo, Guojun Liu, Xiaohui Ma, Yong Wang
Corresponding Author
Tiansheng Zhao
Available Online April 2015.
DOI
10.2991/mebe-15.2015.29How to use a DOI?
Keywords
Facet; Passivation; Diode laser
Abstract

The high vacuum cleaving passivation characteristic on 980nm diode laser is presented. In this research, diode lasers are cleaved in high vacuum cleaving system, and then coated with thin ZnSe passivation layer in the front and the back facet. The function of the passivation layer is to protect diode lasers facet, and prevent impurity particles diffusing into the facet. Finally optical coatings are applied to the AR and HR facets of 5% and 98% respectively in the front and the back facets. The test results of diode lasers output power show that the output power with ZnSe passivation layer method is 9% higher than Si passivation layer, and 21% higher than that uncoated with passivation layer. The diode of uncoated passivation layer is failed when input current is 3.9A, and the diode coated with Si passivation layer is failed when input current is 4.6A, the final failed of the diode is coated ZnSe passivation layer. In conclusion, the method of coated ZnSe passivation layer in high vacuum cleaving system on the diode lasers facet can effectively prevent the catastrophic optical mirror damage, and increase the output power of diode lasers.

Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 2015 International Conference on Materials, Environmental and Biological Engineering
Series
Advances in Engineering Research
Publication Date
April 2015
ISBN
978-94-62520-57-8
ISSN
2352-5401
DOI
10.2991/mebe-15.2015.29How to use a DOI?
Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

risenwbib
TY  - CONF
AU  - Tiansheng Zhao
AU  - Zaijin Li
AU  - Te Li
AU  - Peng Lu
AU  - Yi Qu
AU  - Baoxue Bo
AU  - Guojun Liu
AU  - Xiaohui Ma
AU  - Yong Wang
PY  - 2015/04
DA  - 2015/04
TI  - The High Vacuum Cleaving Passivation Characteristic on 980nm Diode Laser
BT  - Proceedings of the 2015 International Conference on Materials, Environmental and Biological Engineering
PB  - Atlantis Press
SP  - 119
EP  - 122
SN  - 2352-5401
UR  - https://doi.org/10.2991/mebe-15.2015.29
DO  - 10.2991/mebe-15.2015.29
ID  - Zhao2015/04
ER  -