Modeling and Simulation of Multi Gate MOSFET with Reduced Short Channel Effects for High Power Applications
- DOI
- 10.2991/978-94-6463-252-1_59How to use a DOI?
- Keywords
- multigate MOSFET; short channel effects; channel potential; drain resistance effect; overlap length
- Abstract
The Multigate (Double-gate) MOSFET has been proposed for high voltage and high-power applications with decreased short channel effects and drain current with gate overlap. This model takes in to account the short-channel effects (SCEs) in thin-layered MOSFETs with large drain regions by incorporating the drain resistance effect in the device. As a result, the device’s SCEs are reduced. The gate contact overlapped region significantly affects the device operation for high-voltage FETs. These effects are modeled by self-consistent solutions of available multigate MOSFET device models with potential distribution. Multi-gate devices offer a significant benefit of enhanced SCE, as the gate controls the channel electrostatically from multiple sides and increased on state drive current which results in faster circuit speed. The demonstrated model can be further applied for size limitations in the modeling of multigate MOSFETs.
- Copyright
- © 2023 The Author(s)
- Open Access
- Open Access This chapter is licensed under the terms of the Creative Commons Attribution-NonCommercial 4.0 International License (http://creativecommons.org/licenses/by-nc/4.0/), which permits any noncommercial use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license and indicate if changes were made.
Cite this article
TY - CONF AU - Naga Lakshmi Yarlagadda AU - Yogesh Kumar Verma AU - R. Santosh AU - G. Amarnath PY - 2023 DA - 2023/11/09 TI - Modeling and Simulation of Multi Gate MOSFET with Reduced Short Channel Effects for High Power Applications BT - Proceedings of the Second International Conference on Emerging Trends in Engineering (ICETE 2023) PB - Atlantis Press SP - 568 EP - 578 SN - 2352-5401 UR - https://doi.org/10.2991/978-94-6463-252-1_59 DO - 10.2991/978-94-6463-252-1_59 ID - Yarlagadda2023 ER -