Bi2Te3 Thin Films Grown by Magnetron Sputtering

DOI

10.2991/meita-15.2015.93How to use a DOI?

Keywords

Thermoelectric effects, thin films, x-ray diffraction (XRD), magnetron sputtering

Abstract

Bi2Te3 thin films grown the substrate with 80 nm in diameter have been prepared by using magnetron sputtering technique. The structure of thin films was determined by X-ray diffraction experiments. The average grain size and particle size in these powers were measured by the line profile analysis method of X-ray diffraction patterns and by scan electron microscopy, respectively. The thin films were investigated by using SEM measurements. The results indicate that Bi2Te3 alloys could be potentially important TE materials for many applications, especially for prolonged TE device operation at high temperatures, such as for recovery of waste heat from automobile, aircrafts, and power plants due to their superiorphysical properties, including the ability of operating at high temperature/high power conditions, high mechanical strength and stability, and radiation hardness.

Copyright

© 2015, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - X. L. Guo
AU  - J. J. Geng
AU  - Y. H. Zhu
AU  - H. Jiang
AU  - Z. L. Wang
PY  - 2015/08
DA  - 2015/08
TI  - Bi2Te3 Thin Films Grown by Magnetron Sputtering
BT  - Proceedings of the 2015 International Conference on Materials Engineering and Information Technology Applications
PB  - Atlantis Press
SP  - 515
EP  - 518
SN  - 2352-5401
UR  - https://doi.org/10.2991/meita-15.2015.93
DO  - 10.2991/meita-15.2015.93
ID  - Guo2015/08
ER  -