Preparation Methods and Application of Silicon Oxide Films

DOI

10.2991/meic-14.2014.108How to use a DOI?

Keywords

silicon oxide film; preparation methods; application; CVD; PVD

Abstract

Silicon oxide is widely used as a thin film to improve the surface properties of materials, because it is of anti-resistance, hardness, corrosion resistance, dielectric, optical transparency etc. Just as these excellent performances, silicon oxide thin films are used in many fields. There are many ways to get silicon oxide films, such as evaporating deposition, sputtering deposition, ion plating, plasma enhanced chemical vapor deposition (PECVD), atmospheric pressure plasma deposition, sol-gel method and oxidation method etc. and the preparative techniques have obtained a certain research results so far. In this article, the principle and research status of different preparation technologies were summarized, and the application of silicon oxide films were discussed in aspects of packaging industry, microelectronics field, andoptical field. Besides, its application prospect is forecasted. Silicon oxide film swith more stable performance will gradually become industrialization and occupy the dominant position in surface modification for a long time.

Copyright

© 2014, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Guogang Wang
AU  - Haijiao Yang
AU  - Jing Liang
AU  - Qiang Chen
PY  - 2014/11
DA  - 2014/11
TI  - Preparation Methods and Application of Silicon Oxide Films
BT  - Proceedings of the 2014 International Conference on Mechatronics, Electronic, Industrial and Control Engineering
PB  - Atlantis Press
SP  - 479
EP  - 483
SN  - 2352-5401
UR  - https://doi.org/10.2991/meic-14.2014.108
DO  - 10.2991/meic-14.2014.108
ID  - Wang2014/11
ER  -