Research on N-face GaN for solar cells based on MOCVD method
Authors
Tongwei Yu, Yuqiu Sui, Xu Huang, Chenggang Wang
Corresponding Author
Tongwei Yu
Available Online May 2014.
- DOI
- 10.2991/lemcs-14.2014.264How to use a DOI?
- Keywords
- Solar Cell; MOCVD; N-face; GaN; PL
- Abstract
The N face GaN epilayer was prepared on the C face SiC substrate by MOCVD system, and the basic character of the N face GaN was vestegated. A large number of Ga vacancies was formed by a hot phosphoric acid solution etching, which brought a yellow luminescence in the room temperature photoluminescence spectra.
- Copyright
- © 2014, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Tongwei Yu AU - Yuqiu Sui AU - Xu Huang AU - Chenggang Wang PY - 2014/05 DA - 2014/05 TI - Research on N-face GaN for solar cells based on MOCVD method BT - Proceedings of the International Conference on Logistics, Engineering, Management and Computer Science PB - Atlantis Press SP - 1177 EP - 1180 SN - 1951-6851 UR - https://doi.org/10.2991/lemcs-14.2014.264 DO - 10.2991/lemcs-14.2014.264 ID - Yu2014/05 ER -