Sulfur Mustard Detection with Binary Metal Modification on WO3, SnO2 Semiconductor Substrate Surface
Authors
Ligong Zhang, Shi Gao, Xuefeng Wang, Shunping Zhang, Zheng Du, Danping Li, Jinxing Yang, Rong Zhang, Junxiang Chen, Wendan Li, Yong Xu, Guomin Zuo
Corresponding Author
Ligong Zhang
Available Online April 2018.
- DOI
- 10.2991/iwmecs-18.2018.114How to use a DOI?
- Keywords
- Sulfur mustard, WO3, SnO2, semiconductor, binary metal surface modification
- Abstract
In this paper, WO3, SnO2 semiconductor materials and their monometallic and binary metal surface modification counterparts was prepared. Resistance-type Sensors were made by MEMS technology and screen printing, whose resistance signals for mustard gas detection were collected by single-chip microcomputer and LABVIEW control soft. Top nine binary metal modification materials were selected out and their best work temperature, ultra violet light irradiation influence, repeatability and stability were researched. Curve fitting equation between top 9 materials SM and mustard concentration CHD was acquired, which would help us to calculate or estimate the unknown CHD by SM value from test.
- Copyright
- © 2018, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Ligong Zhang AU - Shi Gao AU - Xuefeng Wang AU - Shunping Zhang AU - Zheng Du AU - Danping Li AU - Jinxing Yang AU - Rong Zhang AU - Junxiang Chen AU - Wendan Li AU - Yong Xu AU - Guomin Zuo PY - 2018/04 DA - 2018/04 TI - Sulfur Mustard Detection with Binary Metal Modification on WO3, SnO2 Semiconductor Substrate Surface BT - Proceedings of the 2018 3rd International Workshop on Materials Engineering and Computer Sciences (IWMECS 2018) PB - Atlantis Press SP - 545 EP - 551 SN - 2352-538X UR - https://doi.org/10.2991/iwmecs-18.2018.114 DO - 10.2991/iwmecs-18.2018.114 ID - Zhang2018/04 ER -