Proceedings of the 2022 7th International Conference on Social Sciences and Economic Development (ICSSED 2022)

On the Perfect Path of the Company’s Legal Person Deny System

Authors
Chan Hu
Hubei University of Commerce and Trade
*Corresponding author. Email: 674283694@qq.com
Corresponding Author
Chan Hu
Available Online 29 April 2022.
DOI
10.2991/aebmr.k.220405.271How to use a DOI?
Keywords
Company legal personality denial; Creditor; Defect
Abstract

The corporate personality denial system originated in the United States in the 20th century and has been recognized by most countries since its development. With the rapid development of my country’s market economy, the abuse of corporate personality often occurs, but there are still many defects in the system of corporate personality denial in our country, which cannot comprehensively protect the interests of creditors and social public interests. Therefore, the author believes that it is necessary to improve the system of corporate personality denial from the legislative and judicial levels.

Copyright
© 2022 The Authors. Published by Atlantis Press International B.V.
Open Access
This is an open access article distributed under the CC BY-NC 4.0 license.

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Volume Title
Proceedings of the 2022 7th International Conference on Social Sciences and Economic Development (ICSSED 2022)
Series
Advances in Economics, Business and Management Research
Publication Date
29 April 2022
ISBN
10.2991/aebmr.k.220405.271
ISSN
2352-5428
DOI
10.2991/aebmr.k.220405.271How to use a DOI?
Copyright
© 2022 The Authors. Published by Atlantis Press International B.V.
Open Access
This is an open access article distributed under the CC BY-NC 4.0 license.

Cite this article

TY  - CONF
AU  - Chan Hu
PY  - 2022
DA  - 2022/04/29
TI  - On the Perfect Path of the Company’s Legal Person Deny System
BT  - Proceedings of the 2022 7th International Conference on Social Sciences and Economic Development (ICSSED 2022)
PB  - Atlantis Press
SP  - 1628
EP  - 1632
SN  - 2352-5428
UR  - https://doi.org/10.2991/aebmr.k.220405.271
DO  - 10.2991/aebmr.k.220405.271
ID  - Hu2022
ER  -