Proceedings of the 3rd International Conference on Mechatronics, Robotics and Automation

A summary of the current development of developing technology in the field of integrated circuit manufacturing

Authors
Xue-Ping Liu, Qiang Xu, Feng Ning, Han Wang
Corresponding Author
Xue-Ping Liu
Available Online April 2015.
DOI
10.2991/icmra-15.2015.256How to use a DOI?
Keywords
Developing technology; Developing nozzle; Developing process; Trend
Abstract

Developing technology is critical for the lithography technology in the field of integrated circuit (IC). The developing nozzle and process are the "hard” and "soft" technology, respectively. It is the continuous improvement and innovation of developing nozzle and process that drive the rapid development of lithography technology and IC technology, and promote the reform of information technology. In this paper, we emphatically introduce the development status of developing nozzle and process, and put forward the development trend of developing technology based on the current situation of IC technology in China.

Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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Volume Title
Proceedings of the 3rd International Conference on Mechatronics, Robotics and Automation
Series
Advances in Computer Science Research
Publication Date
April 2015
ISBN
978-94-62520-76-9
ISSN
2352-538X
DOI
10.2991/icmra-15.2015.256How to use a DOI?
Copyright
© 2015, the Authors. Published by Atlantis Press.
Open Access
This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

Cite this article

TY  - CONF
AU  - Xue-Ping Liu
AU  - Qiang Xu
AU  - Feng Ning
AU  - Han Wang
PY  - 2015/04
DA  - 2015/04
TI  - A summary of the current development of developing technology in the field of integrated circuit manufacturing
BT  - Proceedings of the 3rd International Conference on Mechatronics, Robotics and Automation
PB  - Atlantis Press
SP  - 1333
EP  - 1340
SN  - 2352-538X
UR  - https://doi.org/10.2991/icmra-15.2015.256
DO  - 10.2991/icmra-15.2015.256
ID  - Liu2015/04
ER  -