Analytical Model of Channel Electric Field Profile in FinFET
Authors
Ming Fang, Jin He, Wen Wu, Wei Zhao, Ruonan Wang, Mansun Chan, Ping He, Lei Song
Corresponding Author
Ming Fang
Available Online April 2016.
- DOI
- 10.2991/icemie-16.2016.3How to use a DOI?
- Keywords
- double-gate MOSFET; FinFET; channel electrical field; velocity saturation
- Abstract
A simple analytical model for the lateral channel electric field profile in the velocity saturation region of the FinFET with undoped body is proposed and developed by solving the Poisson Equation in the velocity saturation region with a simplified boundary condition. The model has been verified with two-dimensional numerical device simulators and good agreement is obtained. Using the model, the impact of geometrical parameters including silicon film thickness, gate oxide thickness, and the terminal biases on the maximum lateral channel electric field in the FinFET can be predicted.
- Copyright
- © 2016, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Ming Fang AU - Jin He AU - Wen Wu AU - Wei Zhao AU - Ruonan Wang AU - Mansun Chan AU - Ping He AU - Lei Song PY - 2016/04 DA - 2016/04 TI - Analytical Model of Channel Electric Field Profile in FinFET BT - Proceedings of the 2016 International Conference on Electrical, Mechanical and Industrial Engineering PB - Atlantis Press SP - 10 EP - 12 SN - 2352-5401 UR - https://doi.org/10.2991/icemie-16.2016.3 DO - 10.2991/icemie-16.2016.3 ID - Fang2016/04 ER -