Study on Crystalline Volume Fraction and Activation Energy for Silicon Thin Film Prepared by VHF-PECVD
Authors
Qingdong Chen, Junping Wang
Corresponding Author
Qingdong Chen
Available Online June 2017.
- DOI
- 10.2991/iceep-17.2017.128How to use a DOI?
- Keywords
- VHF-PECVD; microcrystalline silicon; activation energy; crystalline volume fraction
- Abstract
Intrinsic microcrystalline silicon thin film were prepared by VHF-PECVD, the activation energy of thin film were measured by activation energy testing equipment. The activation energy of samples with different crystalline volume fraction were studied. The results showed that: the activation energy of samples deposited at amorphous/microcrystalline transition zone decreases crystalline volume fraction increasing.
- Copyright
- © 2017, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Qingdong Chen AU - Junping Wang PY - 2017/06 DA - 2017/06 TI - Study on Crystalline Volume Fraction and Activation Energy for Silicon Thin Film Prepared by VHF-PECVD BT - Proceedings of the 2017 6th International Conference on Energy and Environmental Protection (ICEEP 2017) PB - Atlantis Press SP - 725 EP - 729 SN - 2352-5401 UR - https://doi.org/10.2991/iceep-17.2017.128 DO - 10.2991/iceep-17.2017.128 ID - Chen2017/06 ER -