Research on Pulse Laser for Simulating Transient Radiation Effects on MOS Devices
- DOI
- 10.2991/iceeecs-16.2016.123How to use a DOI?
- Keywords
- MOS; Pulse Laser; Transient Radiation Effects; TCAD
- Abstract
In this paper, the transient radiation effect of MOS devices irradiated by pulse laser is studied using TCAD tool. Firstly, the laser radiation model is built up based on the TCAD tool, and also MOS devices model are created and the I-V characteristics are simulated for proving their correctness. With the pulse laser model, the transient responses of MOS devices working in different modes irradiated by pulse laser are simulated. The results show that the transient radiation effect caused by pulse laser when irradiating MOS devices leads to leakage current of the substrate of MOS devices, and the current amplitude increases with the laser's intensity.
- Copyright
- © 2016, the Authors. Published by Atlantis Press.
- Open Access
- This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).
Cite this article
TY - CONF AU - Mo Li AU - Peng Sun AU - Linzhe Li AU - Jie Li AU - Chunhua Qi AU - Liyi Xiao PY - 2016/12 DA - 2016/12 TI - Research on Pulse Laser for Simulating Transient Radiation Effects on MOS Devices BT - Proceedings of the 2016 4th International Conference on Electrical & Electronics Engineering and Computer Science (ICEEECS 2016) PB - Atlantis Press SP - 618 EP - 622 SN - 2352-538X UR - https://doi.org/10.2991/iceeecs-16.2016.123 DO - 10.2991/iceeecs-16.2016.123 ID - Li2016/12 ER -