Mask Chemical Micromachining of Cylindrical Array Structures on Copper Substrates

DOI

10.2991/fmsmt-17.2017.227How to use a DOI?

Keywords

Microarray, Photoresist, Chemical etching, Micro-machining.

Abstract

The microarray structured surfaces in the nature, such as shark skin and lotus leaf, have good waterproof and anti-friction performances. Besides, the microarray structures above also have good application prospects in heat exchange and biomedicine. Compared to traditional machining with problems of high cost and low efficiency, the mask chemical etching method has the advantages that no residual stress exists when processing, and can be employed for large area preparation with high machining efficiency. We propose to prepare micro cylindrical array structures on copper substrate by mask chemical etching method, and research influences of processing parameters on the size of microarray structures.

Copyright

© 2017, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Mingqian Gao
AU  - Jinlong Song
AU  - Yao Cui
AU  - Changlin Zhao
PY  - 2017/04
DA  - 2017/04
TI  - Mask Chemical Micromachining of Cylindrical Array Structures on Copper Substrates
BT  - Proceedings of the 2017 5th International Conference on Frontiers of Manufacturing Science and Measuring Technology (FMSMT 2017)
PB  - Atlantis Press
SP  - 1158
EP  - 1161
SN  - 2352-5401
UR  - https://doi.org/10.2991/fmsmt-17.2017.227
DO  - 10.2991/fmsmt-17.2017.227
ID  - Gao2017/04
ER  -