Study on chemical mechanical ultra precision process technology of Aluminum Interconnected Line for ULSI

DOI

10.2991/emeit.2012.330How to use a DOI?

Keywords

ULSI, Aluminum interconnection line, Chemical mechanical polishing

Abstract

The chemical mechanical polishing ultra precision process technology mechanism of Aluminum Interconnected Line for ULSI was analyzed according the physical and chemical properties of Aluminum. In order to meet the request of environmental protection and reducing ion staining, the alkaline slurry was adopted. The selection reason of pH value regulator and surfactant was discussed, and their actions during polishing were analyzed. According to the experimental results and optimal technological parameters, the higher removal rate and lower surface roughness were gotten, which were 390nm/min and 0.47nm respectively.

Copyright

© 2012, the Authors. Published by Atlantis Press.

Open Access

This is an open access article distributed under the CC BY-NC license (http://creativecommons.org/licenses/by-nc/4.0/).

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TY  - CONF
AU  - Xin Huan Niu
AU  - Juan Wang
AU  - Ming Sun
AU  - Baimei Tan
AU  - Baohong Gao
PY  - 2012/09
DA  - 2012/09
TI  - Study on chemical mechanical ultra precision process technology of Aluminum Interconnected Line for ULSI
BT  - Proceedings of the 2nd International Conference on Electronic & Mechanical Engineering and Information Technology (EMEIT 2012)
PB  - Atlantis Press
SP  - 1491
EP  - 1494
SN  - 1951-6851
UR  - https://doi.org/10.2991/emeit.2012.330
DO  - 10.2991/emeit.2012.330
ID  - Niu2012/09
ER  -